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CuTi Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Copper Titanium

Short Description:

Category

Alloy Sputtering Target

Chemical Formula

CuTi

Composition

Copper Titanium

Purity

99.9%,99.95%,99.99%

Shape

Plates,Column Targets,arc cathodes,Custom-made

Production Process

Vacuum Melting

Available Size

L≤200mm,W≤200mm


Product Detail

Product Tags

Copper Titanium sputtering target is fabricated by means of vacuum melting. It has the Copper content of 80%~90%,and the balance of Titanium. It demonstrates extremely high strength (1000N/mm^2), excellent stress relaxation behavior and high-temperature suitability. Copper Titanium alloy is a reliable environmentally friendly material. It could improve the hardness, strength, electric conductivity and elongation percentage.

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Copper Titanium Sputtering Materials according to Customers’ specifications. For more information, please contact us.


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